Pulsed Electrodeposition of Copper
نویسنده
چکیده
Pulsed electrolysis of copper has been systematically investigated by electrodepositing copper from a copper sulfate bath. Pulse duty cycles of 5 to 80 percent, at frequencies from 10 to 100 Hz with current densities ranging from 2.5 to 7.5 A/dm2 were employed. The appearance of Hull Cell panels with both direct current and pulsed current was recorded. The influence of pulsed current on current efficiency, cathode potential, and properties of the deposit, such as hardness and porosity, were studied and compared with the same characteristics obtained with conventional d-c plating.
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